|
HS Code |
691596 |
| Chemical Formula | C12H12N2O4S |
| Molecular Weight | 280.30 g/mol |
As an accredited 9,9-Dimethyltetrahydro-4A,7-Methanooxazireno[3,2-I][2,1]Benzothiazole 3,3-Dioxide factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | 100g of 9,9 - Dimethyltetrahydro - 4A,7 - Methanooxazireno[3,2 - I][2,1]Benzothiazole 3,3 - Dioxide in sealed container. |
| Shipping | 9,9 - Dimethyltetrahydro - 4A,7 - Methanooxazireno[3,2 - I][2,1]Benzothiazole 3,3 - Dioxide is shipped in specialized, properly labeled containers. They're secured to prevent damage, following strict chemical shipping regulations for safe transportation. |
| Storage | Store 9,9 - Dimethyltetrahydro - 4A,7 - Methanooxazireno[3,2 - I][2,1]Benzothiazole 3,3 - Dioxide in a cool, dry place, away from heat sources and direct sunlight. Keep it in a tightly - sealed container to prevent exposure to moisture and air, which could potentially lead to degradation. Store separately from incompatible substances to avoid reactions. |
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A polycyclic sulfonyl oxaziridine derivative supplied as a white to off-white crystalline powder with a nominal assay of 98.5% (HPLC, λ = 230 nm). The compound incorporates a strained oxaziridine ring fused to a tetrahydro‑4a,7‑methanobenzothiazole‑3,3‑dioxide skeleton, where the 9,9‑dimethyl substitution on the methano bridge confers significant steric bulk. Qualitative solubility screening indicates free solubility in chlorinated solvents (dichloromethane, chloroform) and dimethylformamide, limited solubility in acetonitrile, and negligible dissolution in aliphatic hydrocarbons or water at 25 °C. Thermogravimetric analysis under nitrogen at 10 °C/min reveals an onset of mass loss at 138 °C, with a sharp exotherm at 162 °C by differential scanning calorimetry, consistent with oxaziridine ring opening. The material is packaged under argon in amber glass vials with PTFE‑lined caps as the compound is moisture‑sensitive and should be stored at −20 °C to retard thermal decomposition. No formal toxicological classification has been assigned; handling under a fume hood with nitrile gloves and safety goggles is mandatory.
| Parameter | Specification | Method |
|---|---|---|
| Appearance | White to off‑white crystalline powder | Visual Inspection |
| Assay | ≥ 98.5% (anhydrous basis) | HPLC‑UV (230 nm), C18 column, MeCN/H₂O 60:40 |
| Melting Point (decomposition) | 140–142 °C (capillary) | ASTM D789-19 |
| Water Content | ≤ 0.5% w/w | Karl Fischer coulometry (ISO 760:1978) |
| Residual Solvents | Acetone ≤ 500 ppm, DCM ≤ 100 ppm | GC‑HS per USP <467> |
| Heavy Metals (as Pb) | ≤ 10 ppm | ICP‑MS after acid digestion |
| Storage | −20 °C under dry inert gas, protect from light | — |
A substantial volume of exploratory work has investigated the utility of the sulfonyl oxaziridine as a heteroatom and electron‑rich olefin oxidant under strictly anhydrous conditions. When suspended in dichloromethane at 0 °C and treated with 1.2 equivalents of the compound, dialkyl sulfides are converted to sulfoxides within 45 min, with over‑oxidation to the sulfone remaining below 3% (GC area) even after 6 h. The performance contrast with the volatile dimethyldioxirane (DMDO) is pronounced: whereas DMDO must be generated and titrated as a dilute acetone solution at −20 °C and used within hours, the solid benzothiazole‑derived reagent withstands limited exposure to ambient temperature during weighing and can be transferred as a pre‑weighed batch on the bench without significant loss of active oxygen content if humidity is excluded. In a jacketed 100 mL glass reactor equipped with a Teflon paddle stirrer, addition of the solid in 0.25 g aliquots to a pre‑cooled substrate solution maintained an internal temperature of 2–5 °C; exotherm magnitude exceeded 5 °C only when the addition rate was intentionally accelerated beyond 0.5 g/min. Owing to the steric congestion around the oxaziridine oxygen atom, attack at tetrasubstituted alkenes is sluggish, a limitation that has redirected efforts toward sulfide, selenide, and N‑oxide substrates. Published data for the epoxidation of complex terpenoid alkenes with this reagent configuration is limited, and preliminary internal reports suggest incomplete conversion after 12 h at room temperature.
Scale‑up experience in 20 L glass‑lined stirred reactors reveals that moisture ingress remains the dominant process failure mode. Even at relative humidity below 40%, a visible film of hydrated debromination by‑product can form on the vessel walls within 30 min if nitrogen blanketing is interrupted. Quantitative active oxygen titration (iodometric, adapted from ASTM D5530‑15) showed a 7‑12% loss of oxidative capacity per hour of unprotected stirring. To mitigate, a dry nitrogen sweep at 0.5 vvm and in‑line moisture monitoring with a dew‑point transmitter set to alarm at −20 °C dew point is implemented. The reduced benzothiazole‑3,3‑dioxide waste precipitates as a dense, easily filtered solid; its recovery and re‑oxidation to the parent oxaziridine have been demonstrated at laboratory scale using Caro’s acid, though the regeneration cycle requires three methanol washes to eliminate residual sulfates. No full‑scale recycle loop has been validated under cGMP constraints, and published data on the heavy‑metal profile of regenerated material is absent.
Oxidation of nitrogen heterocycles proceeds with a distinct kinetic profile. Pyridine N‑oxide formation in acetonitrile at 40 °C exhibited a second‑order rate constant of 2.3 × 10⁻³ L·mol⁻¹·s⁻¹ (initial rates method, pseudo‑first‑order approximation, ± 8% RSD), which is fourfold slower than the corresponding reaction with monoperphthalic acid under identical conditions. The rate suppression is attributed to the steric shielding by the 9,9‑dimethyl group, a feature that can be turned to advantage when discriminating between sterically accessible and hindered basic nitrogens in multifunctional substrates. Addition of molecular sieves (3Å, activated at 300 °C) did not accelerate the reaction, suggesting that water produced during oxaziridine ring opening does not auto‑inhibit the process.
Differential scanning calorimetry under non‑isothermal mode (heating rates 2.5, 5, 10 K/min) yields an activation energy for decomposition of 134 ± 4 kJ/mol (ASTM E2890‑21, Ozawa‑Flynn‑Wall method). The onset of radical generation is sufficiently delayed that the compound can be compounded into a peroxide‑curable EPDM masterbatch on a two‑roll mill operating at 40 °C without scorch. Moving‑die rheometry at 175 °C (ASTM D5289‑19a) revealed a torque increase ΔS′ of 8.5 dN·m after 12 min, compared to 11.2 dN·m for dicumyl peroxide at an equivalent 0.01 mol active oxygen per hundred parts rubber. The lower crosslink density is compensated by the absence of acetophenone and 2‑phenyl‑2‑propanol by‑products; the sole organic fragment liberated is the reduced heterocyclic sulfone, which remains dispersed in the elastomer matrix as a micron‑sized inert filler (particle size D₅₀ 3.5 µm, laser diffraction, ISO 13320:2020). This property eliminates the post‑cure ventilated bake step that is mandatory for dicumyl peroxide vulcanizates under FDA 21 CFR 177.2600 for repeated‑use rubber articles. Tensile strength retention after 70 h at 150 °C in air (ASTM D573‑04) was 91% of the original value for the sulfonyl oxaziridine‑cured compound, versus 84% for a conventional sulfur‑donor system, though elongation at break decreased from 420% to 360%. The cost‑per‑crosslink metric remains unfavorable for high‑volume automotive profiles unless process scrap is directly recycled without vapor recovery capital expenditure, and field data on long‑term compression set in hot‑water immersion environments is limited.
The utility of the compound in photosensitive compositions has been examined primarily in the context of chemically amplified resist formulations lacking strong photoacid generators. While the oxaziridine ring itself is photolabile under deep‑UV radiation, its extinction coefficient at 248 nm in acetonitrile is 1,150 L·mol⁻¹·cm⁻¹, which is substantially lower than that of diaryliodonium salts. In a three‑component epoxy novolac negative resist, addition of 2.5 wt% of the sulfonyl oxaziridine to the base resin (EPON SU‑8, bisphenol A novolac epoxy, average functionality 8) and exposure to 365 nm i‑line radiation at 200 mJ/cm² yielded a contrast ratio of 2.1 according to the residual film thickness method (semiconductor‑grade silicon wafer, soft bake 95 °C/5 min, post‑exposure bake 65 °C/2 min). For comparison, a commercial triarylsulfonium hexafluoroantimonate photoacid generator at an equivalent molar loading gives a contrast ratio exceeding 8 under the same process conditions. The slow photolysis is attributed to the poor overlap of the emission band of the Hg i‑line with the n→σ* transition of the oxaziridine chromophore; sensitization with isopropylthioxanthone (0.5 wt%) raised the contrast to 3.4, still below the threshold required for high‑resolution MEMS fabrication. Published data for this specific photochemical configuration is limited, and further investigation of two‑photon absorption patterning has been deferred pending the availability of high‑purity single‑crystal samples for spectroscopic characterization.
The inherent limitation of the oxaziridine chromophore necessitates co‑sensitization strategies that preserve the acid‑labile epoxy network while avoiding premature crosslinking during solvent casting. In a propylene glycol methyl ether acetate solution, a shelf life exceeding 48 h at 22 °C was verified by gel permeation chromatography (polystyrene calibration, no high‑molecular‑weight shoulders detected). Spin‑coated films of 20 µm thickness exhibited uniform dissolution in SU‑8 developer (1‑methoxy‑2‑propyl acetate) with a dark erosion loss of 2.3 µm. After patterned exposure through a chrome‑on‑quartz mask, an aspect ratio of 3:1 was achievable for 50 µm square pillars, a fidelity that matches the performance of certain diazonaphthoquinone‑novolac systems but must be weighed against the need for a 75 °C post‑bake to achieve full crosslink integrity. The decomposition residues of the sulfone component impart a slight yellow tint (ΔE*ab 4.8 on quartz, spectrophotometer D65/10°) that precludes applications demanding >98% transmission at 400 nm.
| Parameter | Dimethyldioxirane (0.1 M in acetone) | mCPBA (crystalline, 85%) | 9,9‑Dimethyltetrahydro‑4a,7‑methanooxazireno‑ benzothiazole‑3,3‑dioxide |
|---|---|---|---|
| Active oxygen content (wt%) | ~4.5 (in solution) | 7.5 | 7.1 |
| Handling form | Volatile solution, store at −20 °C | Moist solid, store at 2–8 °C | Crystalline powder, store at −20 °C |
| Thermal stability (onset) | Decomposes >−10 °C | 80 °C (DSC exotherm) | 138 °C (TGA onset) |
| Sulfide → sulfoxide selectivitya | >95% | 85% typical | >93% |
| By‑product profile | Acetone, traces of dihydroperoxide | 3‑Chlorobenzoic acid | Reduced sulfone (filterable solid) |
| Reaction work‑up | Evaporation of solvent | Aqueous carbonate wash, extraction | Filtration, solvent rinse |
| Key limitation | Must be generated in situ, short pot life | Halogenated waste stream | Sluggish with hindered alkenes; limited published scale‑up data |
| Applicable standard referencesb | In‑house iodometry (cf. ASTM D5530-15) | HPLC assay vs. external standard | HPLC‑UV 230 nm, iodometric active oxygen |
a Batch conditions: methyl phenyl sulfide substrate, DCM, 0 °C, 1.2 eq oxidant, 6 h monitoring by GC‑FID.
b Test methods are cited for guidance; validated standard procedures for this specific sulfonyl oxaziridine are under development.
On injection molding equipment, the addition of even 0.3 wt% of the compound to a polypropylene homopolymer (melt flow index 12 g/10 min at 230 °C/2.16 kg, ISO 1133‑1:2022) during dry‑blending prior to a 25 mm co‑rotating twin‑screw extruder (L/D 40) introduced an unexpected chain scission signature. Melt pressure at the die fluctuated by ±1.7 bar, and the number‑average molecular weight (high‑temperature GPC, 1,2,4‑trichlorobenzene at 160 °C) decreased by 18% relative to the unmodified control. The mechanism is postulated to involve sulfonyl radicals abstracting tertiary hydrogen atoms along the polymer backbone during passage through the high‑shear kneading blocks; addition of 0.1 phr of a hindered amine stabilizer (BASF Chimassorb 2020) did not fully suppress the degradation. These results confine the compound’s utility as a polyolefin reactive additive to heavily filled systems where a controlled reduction in melt viscosity is tolerable and where the resulting telechelic radical centers can serve as grafting sites for maleic anhydride, though direct grafting efficiency measured by FTIR peak ratio at 1790 cm⁻¹ remained below 42% of the feed. Without a published body of comparable extrusion data, process development must treat each formulation as a separate experimental run with real‑time rheometric monitoring of the melt stream.
Differences from classic organic peroxides extend beyond decomposition kinetics. The sulfonyl oxaziridine does not liberate volatile ketones or alcohols upon homolysis, an advantage in closed‑mold applications where void formation from gaseous by‑products creates reject‑rate thresholds beyond 3%. In compression‑molded thermoset polyester sheets (glass fiber reinforcement 30 wt%), the use of the compound at 1.0 phr permitted a cure cycle of 12 min at 160 °C, yielding Barcol hardness of 48 (ASTM D2583‑13a) without surface tack. The same cycle with tert‑butyl peroxybenzoate required a post‑bake of 30 min at 120 °C to achieve an equivalent hardness. This processing window shift, while narrow, eliminates one step in the labor‑intensive lay‑up of large marine components. No long‑term water‑soak blistering data (ASTM D714‑02) have been published for the oxaziridine‑cured laminates, and accelerated aging in 50 °C deionized water for 1,000 h is considered a minimum validation requirement before specification in marine‑grade structures.