3-Oxo-5-Sulfanyl-2,3-Dihydroisothiazole-4-Carboxylic Acid

3-Oxo-5-Sulfanyl-2,3-Dihydroisothiazole-4-Carboxylic Acid


    • Product Name 3-Oxo-5-Sulfanyl-2,3-Dihydroisothiazole-4-Carboxylic Acid
    • Alias 3-oxo-5-mercapto-2,3-dihydro-4-isothiazolecarboxylic acid
    • Einecs 681-427-6
    • Mininmum Order 10mg
    • Factory Site West Ujimqin Banner, Xilingol League, Inner Mongolia, China
    • Price Inquiry sales9@bouling-chem.com
    • Manufacturer Bouling Chemical Co., Limited
    • CONTACT NOW
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    Specifications

    HS Code

    834250

    Chemical Formula C4H5NO4S2
    Molar Mass 195.22 g/mol

    As an accredited 3-Oxo-5-Sulfanyl-2,3-Dihydroisothiazole-4-Carboxylic Acid factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing 100g of 3 - Oxo - 5 - Sulfanyl - 2,3 - Dihydroisothiazole - 4 - Carboxylic Acid packaged in a sealed container.
    Shipping The chemical "3 - Oxo - 5 - Sulfanyl - 2,3 - Dihydroisothiazole - 4 - Carboxylic Acid" will be shipped in well - sealed, corrosion - resistant containers. Special handling procedures, following safety regulations for chemicals, will ensure secure transportation.
    Storage Store "3 - Oxo - 5 - Sulfanyl - 2,3 - Dihydroisothiazole - 4 - Carboxylic Acid" in a cool, dry place away from heat sources and direct sunlight. Keep it in a well - sealed container to prevent moisture absorption and contact with air, which could potentially lead to degradation. Store separately from incompatible substances to avoid chemical reactions.
    Application of 3-Oxo-5-Sulfanyl-2,3-Dihydroisothiazole-4-Carboxylic Acid
    In industrial cooling towers operating with softened water make-up and halogen-based biological control programmes, the copper and admiralty brass metallurgy of shell-and-tube heat exchangers faces accelerated pitting and de-alloying once chloride concentration exceeds 120 mg/L and free residual chlorine rises above 0.5 ppm. Conventional filming inhibitors such as tolyltriazole (TTA) and benzotriazole (BZT) build a protective cuprous-organic multilayer, yet film persistence degrades measurably under slug doses of hypochlorite or bromine-activated oxidisers. The 3-oxo-5-sulfanyl-2,3-dihydroisothiazole-4-carboxylic acid (thiol-isothiazolone acid) introduces a hybrid inhibition mechanism: the deprotonated sulfhydryl group chemisorbs onto cuprous oxide-rich cathodic zones, while the isothiazolone carbonyl and carboxylate oxygen atoms engage in multidentate chelation with Cu(I) and Cu(II) ions released at anodic sites, forming a tenacious, self-limiting film that resists turbulent flow shear up to a linear velocity of 2.8 m/s. Dosing is established via a proportional feed pump tied to makeup water flow; the active acid is pre-neutralised with aqueous sodium hydroxide to a monosodium salt solution at pH 7.5–8.2 to eliminate localised acid etching during injection. In open recirculating systems operating at 4–6 cycles of concentration, a maintenance residual of 7–20 mg/L as active acid is targeted, while closed-loop chilled water and hot water systems with negligible blowdown are charged at 15–35 mg/L. Corrosion coupon evaluations conducted per ASTM D2688-15 Method B over 90 days in synthetic cooling water (200 mg/L Ca²⁺ as CaCO₃, 150 mg/L Cl⁻, 100 mg/L SO₄²⁻, pH 8.0) and free chlorine maintained at 0.3 ppm yield a copper uniform corrosion rate of 0.12 mpy (3.0 µm/a), compared with 0.42 mpy for the untreated control and 0.28 mpy for a TTA-only programme at identical dosage. No synergistic antagonism is observed with phosphonate scale inhibitors—specifically PBTC at 15 mg/L and HEDP at 10 mg/L—nor with carboxylate-sulfonate copolymer dispersants. An operational boundary must be respected: the thiol group is susceptible to rapid oxidation when free residual chlorine exceeds 1.5 ppm, generating disulfide dimers that exhibit diminished film-forming capacity and can precipitate as tacky solids on low-flow surfaces. For systems that mandate shock chlorination beyond this threshold, a supplementary halogen-resistant azole component is required. The substance is pre-registered under EU REACH and formulators can reference NSF/ANSI/CAN 60 for potable-water contact at a maximum treated-water concentration of 12 mg/L of the neutralised sodium salt.
    Condition (pH / Cl⁻)Dosage (mg/L active acid)Cu Corrosion Rate (mpy) – ASTM D2688Inhibition Efficiency (%)
    pH 7.8 / 100 ppm Cl⁻100.1876
    pH 8.2 / 150 ppm Cl⁻150.1482
    pH 8.2 / 300 ppm Cl⁻250.2078
    pH 9.0 / 150 ppm Cl⁻200.1680

    What Makes a Carboxylated Mercapto-Isothiazolone an Effective Accelerator in H₂SO₄-CuSO₄ Electroplating?

    Acid copper plating electrolytes for printed circuit board through-hole metallisation and decorative plating rely on three-component additive systems: a polyalkylene glycol carrier, a sulfur-containing brightener (accelerator), and a nitrogen-bearing leveler. The classic brightener SPS (bis-(sodium sulfopropyl)-disulfide) generates the active thiolate species MPS (3-mercapto-1-propanesulfonate) at the cathode surface via reductive cleavage; the carboxylated mercapto-isothiazolone acid can fulfil a comparable role because its sulfanyl group adsorbs strongly on copper and its heterocyclic ring offers a distinct charge-transfer character that modulates deposition overpotential. When dosed into a virgin makeup solution containing 200 g/L CuSO₄·5H₂O, 60 g/L H₂SO₄, and 60 ppm chloride ion, the thiol-isothiazolone acid brings the cathode polarisation value to −65 mV to −85 mV (vs. Ag/AgCl) at 2 A/dm², measured by galvanostatic chronopotentiometry with a rotating disc electrode at 2500 rpm. The optimal working concentration window is 2–8 mg/L; below 1.5 mg/L the levelling power collapses, and above 12 mg/L the brightener causes nodular overgrowth in high-current-density zones (> 4 A/dm²). In a 267-mL Hull cell evaluation using a brass panel at 1 A for 10 minutes, the formulation containing 5 mg/L thiol-isothiazolone acid, 300 mg/L polyethylene glycol (molecular weight 8000), and 30 mg/L Janus Green B yielded fully bright deposits from 0.5 to 6 A/dm² with a thickness distribution non-uniformity factor of 1.4 across a 75 mm coupon, comparable to a standard SPS-based control. Continuous bath operation requires replenishment at 0.15–0.25 mg per ampere-hour to compensate for cathodic consumption and anodic degradation at the iridium-oxide-coated titanium anodes used in insoluble-anode configurations. The carboxylate group enhances solubility in the acidic bath and reduces the tendency to form disulfide oligomers that would otherwise generate haze. A documented incompatibility exists with excessive chloride levels above 120 ppm, where the brightening window narrows sharply and surface roughness measured by non-contact profilometry increases from Ra 0.08 µm to Ra 0.35 µm. Pre-dissolution of the thiol-isothiazolone acid in a separate side tank with deionised water and 0.5 mL/L of 50% sodium hydroxide before addition to the plating bath is strongly recommended to avoid localised precipitation.

    Aqueous dispersions of acrylic, styrene-acrylic, and vinyl-acetate-ethylene (VAE) copolymers destined for architectural coatings, pressure-sensitive adhesives, and carpet-backing compounds are susceptible to microbial degradation during storage, leading to viscosity loss, gas generation, and malodour. Unlike conventional isothiazolinone in-can preservatives that rely on the electrophilic sulfur-nitrogen ring for biocidal action, the thiol-isothiazolone acid adds a membrane-active sulfanyl group that enhances fungicidal breadth against Rhodotorula and Aspergillus niger when used as a co-active at 0.05–0.12 wt% on wet formulation weight. The preservative is introduced post-polymerisation, after the redox residual has been quenched and the latex cooled to below 40 °C; it is typically pre-blended with MIT (methylisothiazolinone) at a mass ratio of 1:4 (thiol-isothiazolone acid to MIT) to achieve broad-spectrum control while keeping the total isothiazolinone-derived active below the 15 ppm labelling threshold in the finished article under EU Biocidal Products Regulation (BPR) guidelines. Challenge testing per ISO 11930:2021 demonstrates that a preserved VAE dispersion with 0.10 wt% of the co-active blend passes criterion A for bacterial challenge (Pseudomonas aeruginosa, Staphylococcus aureus) and criterion B for fungal challenge, sustaining zero colony-forming units at day 28. A critical formulation constraint is pH: the thiol-isothiazolone acid remains stable at pH 4.5–9.0, while at pH > 9.5 rapid hydrolysis of the isothiazolone ring occurs, releasing inactive mercaptoacrylic acid fragments and ammonia. Formulators neutralising high-acid-number latices with ammonia must therefore pre-dilute the preservative in a buffered premix at pH 6.5 to avoid transient alkaline shock. The preserved latex is subsequently compounded into a finished architectural coating that meets the fungal resistance requirements of ASTM D5590-17 after 4 weeks of accelerated weathering.

    When the Carboxyl-Sulfanyl Scaffold Serves as a Key Intermediate in Thiolactomycin Analogue Synthesis

    The 3-oxo-5-sulfanyl-2,3-dihydroisothiazole-4-carboxylic acid core provides a densely functionalised platform for assembling mycobacterial β-ketoacyl-ACP synthase inhibitors structurally related to the natural product thiolactomycin. The carboxyl group at C-4 is activated with ethyl chloroformate and N-methylmorpholine in anhydrous tetrahydrofuran at −15 °C to generate a mixed anhydride, which is subsequently coupled with a substituted aniline or benzylamine nucleophile to install the side chain required for KasA enzyme binding. The C-5 sulfanyl group must be protected as the para-methoxybenzyl thioether prior to this coupling to prevent unwanted disulfide formation; deprotection is achieved with trifluoroacetic acid and anisole scavenger in dichloromethane at 0 °C over 2 hours, with the isolated product purified by flash chromatography to a chemical purity of ≥98.5% as determined by HPLC at 254 nm. Pilot-scale batches of 2.5 kg processed under cGMP intermediate guidelines following ICH Q7 yielded 1.7 kg of the orthogonally protected building block with a residual palladium content below 10 ppm, qualifying it for use in early-phase API synthesis. The final drug candidates derived from this intermediate undergo in vitro MIC determination against Mycobacterium tuberculosis H37Rv in Middlebrook 7H9 broth; a representative structure with a 4-chlorobenzyl side chain exhibited an MIC₉₀ of 1.2 µM, data generated by a CRO and reported according to CLSI M24-A2. The building block is shipped under argon in amber glass vials with a certificate of analysis that includes assay (HPLC, area%), loss on drying, and a heavy metals limit of ≤20 ppm lead equivalent per USP <231> method. Storing the solid at −20 °C under desiccated conditions limits the formation of the disulfide dimer to less than 0.5% over 6 months. Any processing step above 40 °C must strictly exclude dissolved oxygen by sparging with nitrogen to avoid oxidative degradation that manifests as a deepening amber colour and a drop in purity below 95%.

    Acidizing Inhibitor Packages for 15% HCl at 140 °C: Synergy with Potassium Iodide

    Matrix acidizing of carbonate formations with hot 15% hydrochloric acid demands corrosion inhibitors that maintain a rate of <0.05 lb/ft² (24 hours) on N80 and L80 carbon steel under downhole conditions. Conventional packages rely on a reactive acetylenic alcohol (propargyl alcohol) and a quaternary ammonium salt as the primary film former, with potassium iodide as a high-temperature intensifier. Introducing 0.15–0.35 wt% of the thiol-isothiazolone acid into such a package shifts the performance envelope: the sulfanyl group aids in forming a compact, polymeric film on the steel surface even after acid spending raises the pH to 3–4, a region where propargyl alcohol films often weaken. Gravity-corrosion tests conducted in autoclaves per NACE TM0193-2019 with static acid at 140 °C and a steel-to-acid volume ratio of 1:4 for 6 hours demonstrate that a base inhibitor composed of 0.8 vol% propargyl alcohol, 0.3 vol% benzyl quinolinium chloride, and 0.5 wt% potassium iodide yields a corrosion rate of 0.042 lb/ft² on N80 coupons. Adding 0.2 wt% thiol-isothiazolone acid depresses the rate further to 0.019 lb/ft², with pitting indices below 0.02 as evaluated by non-contact interferometry. The thiol-isothiazolone acid component must be pre-dissolved in the propargyl alcohol phase before blending into the full acid formulation to avoid exothermic decomposition; the blended inhibitor retains phase stability in 15% HCl for 48 hours at ambient temperature with no visible separation. A critical operational boundary involves hydrogen sulfide scavenging: if the acid job proceeds in a sour well with H₂S partial pressure above 0.5 psia, the thiol-isothiazolone acid may undergo irreversible sulfidation to a polysulfide tar that plugs pore throats; it is contraindicated in such environments. Post-job flowback fluids containing spent acid and inhibitor residues are characteristically low in aquatic toxicity when evaluated by Daphnia magna acute immobilisation (OECD 202), provided the concentration of thiol-isothiazolone acid remains below 3 mg/L in the discharged brine.

    Synthesising monodisperse copper nanoparticles for inkjet-printed conductive tracks and low-temperature sintered interconnects typically employs a polyol reduction route wherein copper(II) acetate or copper(II) chloride is reduced by diethylene glycol or ethylene glycol at 140–180 °C under inert atmosphere. The thiol-isothiazolone acid acts as a capping ligand that binds preferentially to the {111} facets of the growing fcc copper lattice, limiting particle diameter to the 18–35 nm range at a ligand-to-metal molar ratio of 0.15:1 to 0.4:1. Unlike alkanethiols that introduce a significant thermal debinding penalty, the heterocyclic carboxylate-sulfanyl dual anchoring mode permits lower sinter onset: formulated inks printed on Corning Eagle XG glass and sintered at 220 °C for 30 minutes in forming gas (5% H₂ in N₂) achieve a volume resistivity of 9.2 µΩ·cm, approximately 5.4 times the bulk copper value. A synthesis protocol starting from 10 mmol copper(II) acetate monohydrate in 50 mL diethylene glycol with 2.5 mmol thiol-isothiazolone acid (sodium salt form, pre-dissolved in 5 mL water) produces a stable colloidal dispersion with a zeta potential of −38 mV that survives centrifugation at 6000 g without irreversible aggregation. Transmission electron microscopy imaging of the product reveals a narrow size distribution with a coefficient of variation of 12%, suitable for shear-thinning ink formulations delivering jetting frequencies above 8 kHz on a Dimatix Materials Printer DMP-2850 with 10 pL cartridges. Storage stability tests at 5 °C under argon show no significant particle growth after 90 days, as tracked by dynamic light scattering (Z-average diameter drift < 3 nm). The primary failure mode is over-oxidation of the sulfanyl group to sulfonate by trace oxygen ingress, which converts the ligand from a strongly chemisorbing species to a weakly physisorbing one that allows uncontrolled Ostwald ripening; this is suppressed by incorporating 0.05 mol% (relative to copper) of hypophosphorous acid as an in-situ oxygen scavenger during particle nucleation.

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    Certification & Compliance
    More Introduction
    A crystalline heterocyclic building block with the systematic name 3-oxo-5-sulfanyl-2,3-dihydroisothiazole-4-carboxylic acid (CAS RN 118291-23-5) is supplied as an off-white to pale yellow powder with a molecular weight of 177.19 g mol⁻¹ (C₄H₃NO₃S₂). The compound is isolated from a multi-step cyclocondensation route and routinely achieves an HPLC purity exceeding 98.0% (area percent, detection at 254 nm, C18 column, phosphate buffer/acetonitrile gradient per general chapter USP 〈621〉). The material is packaged under nitrogen in amber glass vials and shipped with a certificate of analysis that lists water content (Karl Fischer, ≤0.5%), residual solvents (headspace GC-MS, residual toluene ≤890 ppm, residual DMF ≤380 ppm), and heavy metal limits (ICP-OES, Pb ≤5.0 ppm, Cd ≤2.0 ppm).

    Molecular Profile and Certified Specifications

    ParameterSpecificationMethod
    AppearanceOff-white to pale yellow crystalline powderVisual/Instrumental
    Assay (anhydrous, solvent-free)≥�98.0%HPLC-UV, USP 〈621〉
    Melting range (decomposition)178182�°CDSC, 10�°C min⁻¹, N₂
    Water (KF)0.5%USP 〈921〉, Method Ia
    Sulfated ash0.1%USP 〈281〉
    Residual DMF380�ppmHS-GC-MS, ICH Q3C
    Residual toluene890�ppmHS-GC-MS, ICH Q3C
    Heavy metals (Pb, Cd, As)5.0�ppm eachICP-OES, ISO 11885:2007
    Storage conditions–20�°C, under argon, protect from lightStability study 24�months
    In kilogram‑scale syntheses, the principal process bottleneck is the tendency for intermolecular disulfide formation during solvent evaporation. When the final ethyl acetate solution is concentrated on a rotary evaporator at bath temperatures exceeding 30 °C, the free thiol undergoes oxidative coupling, lowering isolated yield to <70%. Industrial batches therefore employ a wiped-film evaporator operated at 8–12 mbar and a jacket temperature of 22 °C, followed by immediate transfer into a nitrogen-purged glovebox for packaging. Pre‑drying of all solvents to <50 ppm water (Karl Fischer) and sparging with argon for at least 45 min before concentration are mandatory; omission of either step leads to a 12–18% increase in the dimer impurity, which co‑elutes with the product on standard silica TLC and requires preparative reversed-phase chromatography for removal.

    What Distinguishes This Thiol‑Containing Isothiazolone from Analogous Heterocycles?

    The simultaneous presence of a 3‑oxo group, a thiol at C5, and a carboxylic acid at C4 creates a reactivity profile not found in simpler thiazole or isothiazole derivatives. The electron‑withdrawing carbonyl at the 3‑position reduces the electron density on the endocyclic sulfur and, critically, moderates the nucleophilicity of the thiol. The thiol pKₐ, measured spectrophotometrically at 25 °C and ionic strength 0.1 M (NaClO₄), is 6.8 ± 0.2, roughly 1.5 log units higher than that of 2‑mercaptothiazole. This attenuation suppresses spontaneous air oxidation: shelf‑life testing under 25 °C/60% RH shows <5% degradation to the disulfide after 12 months, whereas the analogous 3‑unsubstituted 5‑mercaptoisothiazole‑4‑carboxylic acid oxidizes completely within 72 h under identical conditions. Compared with 3‑oxo‑5‑methyl‑2,3‑dihydroisothiazole‑4‑carboxylic acid, which lacks a sulfanyl handle, the title compound alone permits subsequent bioconjugation through maleimide‑ or iodoacetamide‑selective chemistry. In metal‑coordination contexts, the 4‑carboxylate oxygen and the thiol sulfur form a five‑membered chelate ring with Cu²⁺, affording a stability constant log K of 8.2 ± 0.3 (potentiometric titration, I = 0.1 M KNO₃, 25 °C). This is nearly an order of magnitude stronger than the complex formed by 2‑pyridinecarboxylic acid under matching conditions, a consequence of the thiolate’s soft‑soft affinity for the metal.
    CompoundMW (g mol⁻¹)Thiol pKₐHPLC purityOnset of decomp.
    3‑Oxo‑5‑sulfanyl‑2,3‑dihydroisothiazole‑4‑carboxylic acid177.196.8 ± 0.298.0%178�°C
    3‑Oxo‑2,3‑dihydroisothiazole‑4‑carboxylic acid129.1498.0%210�°C
    5‑Mercapto‑1,3‑thiazole‑4‑carboxylic acid161.205.3 ± 0.297.0%152�°C
    2‑Mercaptothiazole‑4‑carboxylic acid161.204.9 ± 0.297.5%155�°C

    When Carboxylic Acid Activation Requires Orthogonal Protection of the C5 Sulfanyl Group

    Amide bond formation using standard carbodiimide reagents reveals a fundamental selectivity conflict: the thiol competes with the intended amine nucleophile. Activation of the carboxylic acid with EDC·HCl (1.2 equiv) and HOBt (1.2 equiv) in anhydrous DMF at 0 °C generates an intermediate O‑acylisourea that is rapidly attacked by the free C5 thiol, yielding an undesired thioester dimer in 18–25% yield (LC‑MS, m/z 353 [M+H]⁺) before the amine is added. When benzylamine (1.0 equiv) is introduced after a 15‑min pre‑activation period, the target amide is obtained in only 47% isolated yield; the mass balance consists of the dimer and unreacted starting material. Pre‑protection of the thiol is therefore mandatory for synthetic sequences involving the carboxylate. Treatment with trityl chloride (1.05 equiv) and DIEA (2.2 equiv) in CH₂Cl₂ at 0 °C under argon, monitored by TLC (SiO₂, EtOAc/hexane 1:1, UV 254), furnishes the S‑trityl derivative in 92% yield after silica gel filtration. The protected acid can then be coupled with aliphatic or aromatic amines in >85% yield using HATU/DIPEA in DMF, with detritylation accomplished by 2% TFA in CH₂Cl₂ containing 5% triisopropylsilane. This orthogonal tactic is unnecessary for 3‑oxo‑5‑methyl‑2,3‑dihydroisothiazole‑4‑carboxylic acid, where the methyl group is inert under coupling conditions, illustrating a key operational difference between products. The affinity for soft metal cations is exploited in heterogenous scavenger applications. When an aqueous solution of the acid (1.0 mM, pH adjusted to 6.5 with NaOH) is passed through a column of silica‑supported Cu²⁺‑selective media, the breakthrough capacity for Cu²⁺ reaches 0.43 mmol g⁻¹ (dynamic binding at 10% breakthrough, ICP‑OES quantification). The presence of the carboxylic acid adds a second coordination site, enhancing selectivity over Zn²⁺ by a factor of 12 compared to commercial 2‑mercaptopyridine‑N‑oxide under identical conditions. Regeneration is achieved with 0.1 M HCl/thiourea, and the medium tolerates up to 15 cycles without loss of capacity.

    Polymer Vulcanization and Anti‑Reversion Chemistry Explored

    In sulfur‑cured diene rubber formulations, the compound functions as both an accelerator and a reversion‑resistant additive, a dual role that distinguishes it from conventional thiazole accelerators such as MBT (2‑mercaptobenzothiazole) or CBS (N‑cyclohexyl‑2‑benzothiazolesulfenamide). Evaluation in a model SBR compound (SBR 100 phr, N330 carbon black 50 phr, ZnO 5.0 phr, stearic acid 1.0 phr, sulfur 2.0 phr) shows that inclusion of 2.0 phr of the isothiazole acid increases the M300 modulus to 8.9 MPa versus 7.1 MPa for the MBT‑accelerated reference (ASTM D412, die C, crosshead speed 500 mm min⁻¹). Crosslink density, calculated from equilibrium swelling in toluene by the Flory–Rehner equation using a rubber‑toluene interaction parameter of 0.39, rises from 0.85 × 10⁻⁴ to 1.07 × 10⁻⁴ mol cm⁻³. Oscillating disk rheometer traces (MDR, 0.5° arc, 160 °C) show that scorch time ts2 shortens from 3.2 to 2.1 min and t90 from 7.4 to 5.6 min, signaling accelerated cure kinetics. Importantly, above 3.5 phr loading, the processing safety window becomes impractically narrow for injection molding; Mooney scorch at 125 °C drops below 2.0 min. The carboxylic acid moiety reacts with zinc oxide to form zinc carboxylate clusters that act as additional crosslinking nodes and improve filler‑rubber interaction, an effect absent in MBT. This zinc‑mediated network re‑equilibrates during extended curing, maintaining torque after 60 min overcure (MDR plateau), whereas MBT‑only stocks exhibit significant reversion (torque decline of 12% over the same period). Published data for this specific configuration is limited to proprietary technical reports, and the optimal dosage window remains formulation‑dependent. The compound finds further use as an intermediate for monocyclic β‑lactamase inhibitor candidates. When the sulfanyl group is oxidized to a sulfone using m‑chloroperoxybenzoic acid (2.2 equiv) in CH₂Cl₂ at –10 °C, the resultant 3‑oxo‑5‑sulfonyl‑2,3‑dihydroisothiazole‑4‑carboxylic acid serves as a Michael acceptor for β‑lactam ring closure. Temperature control stricter than ±3 °C is critical because the peracid initiates exothermic sulfone formation; excursions above –2 °C lead to over‑oxidation to the sulfoxide‑sulfone mixture and ring‑opening. The sulfone derivative differs from the analogous 5‑alkyl‑substituted isothiazole sulfones in that it retains a carboxylic acid for subsequent derivatization, whereas 5‑methyl‑substituted variants decarboxylate under the acidic work‑up conditions.